Study of reactive HiPIMS process and its use for ternary nitrides coatings deposition
Školitel: Petr Vašina
Instituce: Masaryk University, Faculty of Science
Obor: Plasma physics
O mém projektu
The main goal of this project is to study and understand a perspective sputtering method – Reactive - High Power Impulse Magnetron Sputtering (R-HiPIMS) for the deposition of novel ternary nitrides. Optical Emission Spectroscopy and Effective Branching Fractions method will be utilized for precise analysis of the R-HiPIMS. TiTaN and TiZrN thin films will be deposited and optimized utilizing the knowledge of the process dynamics as candidates for the next generation of protective coatings.